Applied Materials, Inc.

Aaron Eppler

Qian Fu

Mukund Srinivasan

Zhonghua Yao

Exemplary semiconductor processing methods may include depositing a boron-containing material on the substrate. The boron-containing material may extend along sidewalls of the one or more features in the substrate. The methods may include forming a plasma of an oxygen-containing precursor and contacting the substrate with plasma effluents of the oxygen-containing precursor. The contacting may etch a portion of the one or more features in the substrate. The contacting may oxidize the boron-containing material.

Growing community of inventors

Los Gatos, CA, United States of America

Aaron Eppler