Daejeon, South Korea

A Rah Cho

USPTO Granted Patents = 1 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: A Rah Cho: Innovator in Substrate Treatment Technology

Introduction

A Rah Cho is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of a unique patent that addresses the challenges associated with bubble measurement in liquid treatment processes.

Latest Patents

A Rah Cho holds a patent for a "Bubble measurement unit, substrate treating apparatus including the same, and bubble measurement method." This inventive concept relates to an apparatus designed for treating a substrate. The apparatus features a liquid supply unit that delivers liquid to the substrate, a cover made of a light-transmitting material that provides an inspection area, and an inspection unit that examines bubbles present in the liquid. The inspection unit is equipped with a light source that illuminates the inspection area, a light receiving part that captures the light passing through, and an inspection part that analyzes the bubbles based on the received light. This innovative technology enhances the efficiency and accuracy of substrate treatment processes.

Career Highlights

Throughout his career, A Rah Cho has worked with reputable organizations, including Semes Co., Ltd. and Seoul National University. His experience in these institutions has allowed him to refine his skills and contribute to advancements in substrate treatment technology.

Collaborations

A Rah Cho has collaborated with talented individuals such as Jung Suk Goh and Hyungmin Park. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

A Rah Cho's contributions to substrate treatment technology through his innovative patent demonstrate his commitment to advancing the field. His work not only addresses practical challenges but also paves the way for future innovations in the industry.

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