Company Badge
USPTO Data Jan 1 1976 - Oct 20 2026
11 Patents
#1,808 in Tokyo
#4,139 in Japan
#51,801 in the World
Sokkisha Co., Ltd.
Forward Citations = 182
21 inventors:
Sokkisha Co., Ltd.
Trademarks = 1
Forward Citations = 182
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21 inventors (with patents filed for the assignee):
Yutaka Nakamura (2 out of 2 patents)
Kenji Indo (2 out of 3 patents)
Shigeyuki Sawaguchi (2 out of 2 patents)
4. Ryuji Kohno (1 out of 7 patents)
5. Hideya Kawachi (1 out of 1 patent)
6. Minoru Chiba (1 out of 1 patent)
7. Hideki Imai (1 out of 8 patents)
8. Hefeng Wang (1 out of 1 patent)
9. Haruo Fukawa (1 out of 1 patent)
10. Masayoshi Tanaka (1 out of 1 patent)
11. Ichiro Kadowaki (1 out of 1 patent)
12. Masamitsu Endo (1 out of 1 patent)
13. Yasuo Hayama (1 out of 1 patent)
14. Kazunori Miyahara (1 out of 1 patent)
15. Masahiro Kurimoto (1 out of 1 patent)
11 patents:
Company Overview
Sokkisha Co., Ltd., based in Tokyo, specializes in precision measurement instruments and surveying equipment. The company is recognized for its innovative solutions in the fields of civil engineering, construction, and geospatial technologies. Sokkisha's product range includes total stations, theodolites, and other advanced measuring devices that enhance accuracy and efficiency in various surveying applications. With a commitment to quality and technological advancement, Sokkisha plays a significant role in supporting infrastructure development and land management initiatives.
Profile summary synthesized from public USPTO records and patent filings.
IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Sokkisha Co., Ltd.. Retrieved from https://idiyas.com/company/sokkisha-company
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]