Company Badge
USPTO Data Jan 1 1976 - Oct 20 2026
12 Patents
#4 in Easley, SC
#153 in South Carolina
#25,578 in US
#48,209 in the World
Ortec, Inc.
Forward Citations = 96
23 inventors:
Easley, SC, United States of America
Ortec, Inc.
% Expired Patents = 8.3
Trademarks = 10
Forward Citations = 96
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23 inventors (with patents filed for the assignee):
David L Brotherton (3 out of 3 patents)
Thomas W Raudorf (2 out of 4 patents)
Kwok W Fung (2 out of 2 patents)
4. Kam H Wong (2 out of 2 patents)
5. Michael O Bedwell (2 out of 2 patents)
6. Ronald Nutt (1 out of 28 patents)
7. Kim Hyun Don (1 out of 1 patent)
8. Chung Hae Ryong (1 out of 1 patent)
9. Song Mi Kyung (1 out of 1 patent)
10. Bae Chang Seok (1 out of 1 patent)
11. Joung Young Gak (1 out of 1 patent)
12. Hyun Myung Eok (1 out of 1 patent)
13. Charles W Williams (1 out of 10 patents)
14. Michael Leon Simpson (1 out of 35 patents)
15. Charles L Britton, Jr (1 out of 23 patents)
12 patents:
Company Overview
Ortec, Inc. is a technology-driven company based in Easley, South Carolina, specializing in advanced materials and innovative solutions for various industries. The organization focuses on developing high-performance products that enhance efficiency and sustainability across sectors such as aerospace, automotive, and industrial applications. With a commitment to research and development, Ortec leverages its expertise to create cutting-edge technologies that address complex challenges and drive progress in material science.
Profile summary synthesized from public USPTO records and patent filings.
IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Ortec, Inc.. Retrieved from https://idiyas.com/company/ortec
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]