Hong Kong, China

Edge Electrons Limited


USPTO Granted Patents = 12


Forward Citations = 26

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13 inventors (with patents filed for the assignee):

goldMedal Neal George Stewart (12 out of 28 patents)

silverMedal Jian Carlo Decena Zapata (5 out of 5 patents)

bronzeMedal Gordon Currie (4 out of 4 patents)

4.  Wing Ling Cheng (4 out of 24 patents)

5.  Efren Santos Cruzat, Ii (1 out of 1 patent)

6.  Leonard Ostil Torio (1 out of 1 patent)

7.  Ben Frickel (1 out of 1 patent)

8.  Julie Ann Estolonio (1 out of 1 patent)

9.  Shaira Joyce Prado (1 out of 1 patent)

10.  Gaia Maria Javier (1 out of 1 patent)

11.  Jian Zapata (1 out of 1 patent)

12.  Richard McIndoe (1 out of 1 patent)

13.  Efren Ii Santos Cruzat (1 out of 1 patent)

14.  Gordon Currie (0 patent)

15.  Jian Carlo Decena Zapata (0 patent)


12 patents:

Company Overview
Edge Electrons Limited is a Hong Kong-based company specializing in advanced electronic solutions and innovative technologies. The organization focuses on the development and manufacturing of cutting-edge electronic components and systems, catering to various industries including telecommunications, consumer electronics, and industrial automation. With a commitment to research and development, Edge Electrons aims to enhance the efficiency and performance of electronic devices, positioning itself as a key player in the rapidly evolving technology landscape.
Profile summary synthesized from public USPTO records and patent filings.

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USPTO Data Jan 1 1976 - Oct 20 2026

12 Patents

#271 in Hong Kong

#2,364 in China

#48,209 in the World

Hong Kong, CN
Hong Kong, China
Forward Citations = 26

13 inventors:

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Edge Electrons Limited. Retrieved from https://idiyas.com/company/edge-electrons

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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