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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US RE49784 B1

PDFFull Text
Date of Patent:
Jan. 02, 2024

Filed:

Aug. 27, 2020

Apparatus of plural charged-particle beams

Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Weiming Ren, San Jose, CA (US);

Xuedong Liu, San Jose, CA (US);

Xuerang Hu, San Jose, CA (US);

Zhong-wei Chen, San Jose, CA (US);

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:

Finnegan, Henderson, Farabow, Garrett & Dunner, LLP

Primary Examiner:

James A Menefee

Int. Cl.
CPC ...
H01J 37/06 (2006.01); H01J 37/28 (2006.01); H01J 37/147 (2006.01); H01J 37/22 (2006.01); G01N 23/2251 (2018.01); H01J 37/145 (2006.01); H01J 37/05 (2006.01); H01J 37/244 (2006.01);
U.S. Cl.
CPC ...
H01J 37/06 (2013.01); G01N 23/2251 (2013.01); H01J 37/05 (2013.01); H01J 37/145 (2013.01); H01J 37/1474 (2013.01); H01J 37/226 (2013.01); H01J 37/244 (2013.01); H01J 37/28 (2013.01); G01N 2223/418 (2013.01); G01N 2223/6116 (2013.01); H01J 2237/057 (2013.01); H01J 2237/2448 (2013.01); H01J 2237/2817 (2013.01);
Abstract

A new multi-beam apparatus with a total FOV variable in size, orientation and incident angle, is proposed. The new apparatus provides more flexibility to speed the sample observation and enable more samples observable. More specifically, as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry, the new apparatus provide more possibilities to achieve a high throughput and detect more kinds of defects.

Find Patent Forward Citations

Ren, Weiming. (2024). Apparatus of plural charged-particle beams (U.S. Patent No. RE49784). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/RE49784

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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