The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2018
Filed:
Jun. 13, 2016
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Pavel Kolchin, Fremont, CA (US);
Mikhail Haurylau, San Jose, CA (US);
Robert Danen, Pleasanton, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G01N 21/95 (2006.01); G06T 7/00 (2017.01); H04N 5/225 (2006.01); G01N 21/88 (2006.01); G02B 5/30 (2006.01);
U.S. Cl.
CPC ...
G01N 21/9505 (2013.01); G01N 21/8851 (2013.01); G02B 5/3083 (2013.01); G06T 7/004 (2013.01); G06T 7/0012 (2013.01); G06T 7/0051 (2013.01); H04N 5/2256 (2013.01); G01N 2021/8874 (2013.01); G06T 2207/30148 (2013.01);
Abstract
A computer-based apparatus for adjusting an auto-focus in a wafer inspection system, including: a wafer adjustment system; and an electronic feedback loop system configured to compare an intensity of a first light beam rotating in a first spiral about a first central axis, and when the intensity is less than a preselected threshold, adjust, using the wafer adjustment system, a position of the wafer until the intensity reaches the preselected threshold.