The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2018
Filed:
May. 24, 2013
Air Products and Chemicals, Inc., Allentown, PA (US);
Manchao Xiao, San Diego, CA (US);
Xinjian Lei, Vista, PA (US);
Daniel P. Spence, Carlsbad, CA (US);
Haripin Chandra, Vista, CA (US);
Mark Leonard O'Neill, San Marcos, PA (US);
VERSUM MATERIALS US, LLC, Tempe, AZ (US);
Abstract
Described herein are precursors and methods for forming silicon-containing films. In one aspect, there is a precursor of following Formula I: wherein Rand Rare independently selected from linear or branched Cto Calkyl group, a linear or branched Cto Calkenyl group, a linear or branched Cto Calkynyl group, a Cto Cdialkylamino group, an electron withdrawing and a Cto Caryl group; Rand Rare independently selected from hydrogen, a linear or branched Cto Calkyl group, a linear or branched Cto Calkenyl group, a linear or branched Cto Calkynyl group, a Cto Cdialkylamino group, an electron withdrawing, and a Cto Caryl group; and wherein any one, all, or none of Rand R, Rand R, Rand R, or Rand Rare linked to form a ring.