The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2018
Filed:
Oct. 03, 2017
Globalfoundries Inc., Grand Cayman, KY;
Lei Sun, Albany, NY (US);
Ruilong Xie, Schenectady, NY (US);
Xunyuan Zhang, Albany, NY (US);
Ryan Ryoung-Han Kim, Bertem, BE;
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Abstract
A method includes providing a structure having a dielectric layer, a 1hardmask layer, a 2hardmask layer and a 1mandrel layer disposed respectively thereon. A 1mandrel plug is disposed in the 1st mandrel layer. A 2mandrel layer is disposed over the 1mandrel layer. The 1and 2mandrel layers are etched to form a plurality 1st mandrels, wherein the 1mandrel plug extends entirely through a single 1mandrel. The 1mandrel plug is etched such that it is self-aligned with sidewalls of the single 1mandrel. The 1mandrels are utilized to form mandrel metal lines in the dielectric layer. The 1mandrel plug is utilized to form a self-aligned mandrel continuity cut in a single mandrel metal line formed by the single 1mandrel.