The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2018
Filed:
Mar. 27, 2014
Intel Corporation, Santa Clara, CA (US);
James M. Blackwell, Portland, OR (US);
Patricio E. Romero, Portland, OR (US);
Scott B. Clendenning, Portland, OR (US);
Grant M. Kloster, Lake Oswego, OR (US);
Florian Gstrein, Portland, OR (US);
Harsono S. Simka, Saratogo, CA (US);
Paul A. Zimmerman, Phoenix, AZ (US);
Robert L. Bristol, Portland, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Precursor and process design for photo-assisted metal atomic layer deposition (ALD) and chemical vapor deposition (CVD) is described. In an example, a method of fabricating a thin metal film involves introducing precursor molecules proximate to a surface on or above a substrate, each of the precursor molecules having one or more metal centers surrounded by ligands. The method also involves depositing a metal layer on the surface by dissociating the ligands from the precursor molecules using a photo-assisted process.