The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2018
Filed:
Aug. 31, 2016
Applicant:
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Inventors:
Emad Aqad, Northborough, MA (US);
William Williams, III, Ipswich, MA (US);
Cong Liu, Shrewsbury, MA (US);
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/38 (2006.01); C07C 69/753 (2006.01); C07C 303/32 (2006.01); C07C 309/00 (2006.01); C07C 309/12 (2006.01); C08F 218/14 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); C07C 321/30 (2006.01); G03F 7/30 (2006.01); C08F 232/08 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 69/753 (2013.01); C07C 303/32 (2013.01); C07C 309/00 (2013.01); C07C 309/12 (2013.01); C07C 321/30 (2013.01); C08F 218/14 (2013.01); C08F 232/08 (2013.01); G03F 7/039 (2013.01); G03F 7/2053 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); C07C 2102/42 (2013.01); C07C 2103/74 (2013.01);
Abstract
A photoacid-generating compound has the structure where R, R, R, R, Q, and X are defined herein. The photoacid-generating compound can be used as a component of a photoresist composition, or as a monomer incorporated into a polymer useful in a photoresist composition. The photoacid-generating compound provides a desired balance of solubility and line width roughness.