The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2018
Filed:
Sep. 26, 2014
Air Products and Chemicals, Inc., Allentown, PA (US);
Haripin Chandra, San Marcos, CA (US);
Anupama Mallikarjunan, San Marcos, CA (US);
Xinjian Lei, Vista, CA (US);
Moo-Sung Kim, Gyunggi-Do, KR;
Kirk Scott Cuthill, Vista, CA (US);
Mark Leonard O'Neill, Gilbert, AZ (US);
VERSUM MATERIALS US, LLC, Tempe, AZ (US);
Abstract
Methods for forming silicon nitride films are disclosed that comprise the steps of: providing a substrate in a reactor; introducing into the reactor an at least one organoaminosilane having a least one SiHgroup described herein wherein the at least one organoaminosilane reacts on at least a portion of the surface of the substrate to provide a chemisorbed layer; purging the reactor with a purge gas; introducing a plasma comprising nitrogen and an inert gas into the reactor to react with at least a portion of the chemisorbed layer and provide at least one reactive site wherein the plasma is generated at a power density ranging from about 0.01 to about 1.5 W/cm.