The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2018

Filed:

Jun. 03, 2016
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Inventors:

Tsung-Hsing Yu, Taipei, TW;

Shih-Syuan Huang, Taichung, TW;

Ken-Ichi Goto, Hsin-Chu, TW;

Yi-Ming Sheu, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/10 (2006.01); H01L 21/8234 (2006.01); H01L 27/088 (2006.01); H01L 29/165 (2006.01); H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 21/265 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1054 (2013.01); H01L 21/26586 (2013.01); H01L 21/823412 (2013.01); H01L 21/823425 (2013.01); H01L 27/088 (2013.01); H01L 29/1083 (2013.01); H01L 29/165 (2013.01); H01L 29/6659 (2013.01); H01L 29/66492 (2013.01); H01L 29/7833 (2013.01); H01L 21/2658 (2013.01);
Abstract

The present disclosure relate to an integrated chip having long-channel and short-channel transistors having channel regions with different doping profiles. In some embodiments, the integrated chip includes a first gate electrode arranged over a first channel region having first length, and a second gate electrode arranged over a second channel region having a second length greater than the first length. The first channel region and the second channel region have a dopant profile, respectively along the first length and the second length, which has a dopant concentration that is higher by edges than in a middle of the first channel region and the second channel region. The dopant concentration is also higher by the edges of the first channel region than by the edges of the second channel region.


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