The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 2017

Filed:

Mar. 30, 2016
Applicant:

Mentor Graphics Corporation, Wilsonville, OR (US);

Inventors:

Valeriy Sukharev, Campbell, CA (US);

Junho Choy, Sunnyvale, CA (US);

Armen Kteyan, Yerevan, AM;

Henrik Hovsepyan, Yerevan, AM;

Assignee:

Mentor Graphics Corporation, Wilsonville, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 9/455 (2006.01); G06F 17/50 (2006.01); H01L 27/02 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5072 (2013.01); G06F 17/5081 (2013.01); H01L 27/0207 (2013.01);
Abstract

Aspects of the disclosed technology relate to techniques of inserting stress-enhancing filler cells for leakage reduction. Stress analysis is first performed to identify devices with large leakage current in a layout design. An optimization zone in a row of cells that contains one or more of the devices with large leakage current is then determined. Stress-enhancing filler cells are inserted into the optimization zone to replace some or all of the one or more filler cells while placement of the cells in the optimization zone is adjusted based on a leakage reduction analysis.


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