The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2017

Filed:

Apr. 21, 2015
Applicant:

Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;

Inventors:

Tomoyasu Shojo, Tokyo, JP;

Hajime Kawano, Tokyo, JP;

Yasunari Sohda, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/09 (2006.01); G01N 23/225 (2006.01); H01J 37/12 (2006.01); H01J 37/10 (2006.01); H01J 37/147 (2006.01);
U.S. Cl.
CPC ...
H01J 37/12 (2013.01); H01J 37/09 (2013.01); H01J 37/10 (2013.01); H01J 37/147 (2013.01); H01J 37/28 (2013.01); H01J 2237/103 (2013.01); H01J 2237/24592 (2013.01); H01J 2237/28 (2013.01);
Abstract

In the present invention, a charged particle beam device has a charged particle source (), a first condenser lens () arranged downstream from the charged particle source (), an aperture () arranged downstream from the first condenser lens (), and a second condenser lens () arranged downstream from the aperture (), wherein, when a sample () is to be irradiated at a second charged particle beam amount which is greater than a first charged particle beam amount, the first and second condenser lenses are controlled such that a charged particle beam is formed downstream from the aperture (), and such that the focal point of the second condenser lens does not vary between the first charged particle beam amount and the second charged particle beam amount.


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