The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2017
Filed:
Feb. 02, 2015
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Inventors:
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 7/00 (2017.01); G06K 9/03 (2006.01); G01N 21/95 (2006.01); G01N 21/956 (2006.01); G06K 9/46 (2006.01); G06K 9/62 (2006.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G01N 21/9501 (2013.01); G01N 21/95607 (2013.01); G06K 9/03 (2013.01); G06K 9/46 (2013.01); G06K 9/6202 (2013.01); G01N 2021/95676 (2013.01); G06K 2009/4666 (2013.01); G06T 2207/30141 (2013.01); G06T 2207/30148 (2013.01);
Abstract
The present disclosure provides a method including providing a first image and a second image. The first image is of a substrate having a defect and the second image is of a reference substrate. A difference between the first image and the second image is determined. A simulation model is used to generate a simulation curve corresponding to the difference and the substrate dispositioned based on the simulation curve. In another embodiment, the scan of a substrate is used to generate a statistical process control chart.