The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2017
Filed:
Jul. 15, 2015
Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;
The University of Tokyo, Bunkyo-ku, Tokyo, JP;
Yuko Otani, Tokyo, JP;
Shunji Maeda, Tokyo, JP;
Yuta Urano, Tokyo, JP;
Toshifumi Honda, Tokyo, JP;
Takehiro Hirai, Tokyo, JP;
Satoru Takahashi, Tokyo, JP;
Kiyoshi Takamasu, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
The University of Tokyo, Tokyo, JP;
Abstract
A method for reviewing a defect including a light capturing step that illuminates a sample with light under plural optical conditions, while varying only at least one of illumination conditions, sample conditions, or detection conditions, and detects plural lights scattering from the sample; a signal obtaining step that obtains plural signals based on the lights detected; and a processing step that discriminates a defect from noise according to a waveform characteristic quantity, an image characteristic quantity, or a value characteristic quantity created using the signals and derives the coordinates of defect.