The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2017
Filed:
Dec. 04, 2014
Applied Materials, Inc., Santa Clara, CA (US);
David Thompson, San Jose, CA (US);
Huixiong Dai, San Jose, CA (US);
Patrick M. Martin, Capitola, CA (US);
Timothy Michaelson, Milpitas, CA (US);
Kadthala R. Narendrnath, San Jose, CA (US);
Robert Jan Visser, Menlo Park, CA (US);
Jingjing Xu, Cupertino, CA (US);
Lin Zhang, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Provided are methods for selective deposition. Certain methods describe providing a first substrate surface; providing a second substrate surface; depositing a first layer of film over the first and second substrate surfaces, wherein the deposition has an incubation delay over the second substrate surface such that the first layer of film over the first substrate surface is thicker than the first layer of film deposited over the second substrate surface; and etching the first layer of film over the first and second substrate surfaces, wherein the first layer of film over the second substrate surface is at least substantially removed, but the first layer of film over the first substrate is only partially removed.