The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2017

Filed:

Jun. 25, 2013
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Patrick Morrow, Portland, OR (US);

Kimin Jun, Hillsboro, OR (US);

M. Clair Webb, North Logan, UT (US);

Donald W. Nelson, Beaverton, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/088 (2006.01); H01L 21/84 (2006.01); H01L 27/06 (2006.01); H01L 27/11 (2006.01); H01L 21/8234 (2006.01); H01L 27/12 (2006.01); H01L 21/768 (2006.01); H01L 21/822 (2006.01); H01L 23/538 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0688 (2013.01); H01L 21/76895 (2013.01); H01L 21/76897 (2013.01); H01L 21/8221 (2013.01); H01L 21/823431 (2013.01); H01L 21/845 (2013.01); H01L 23/5386 (2013.01); H01L 27/0886 (2013.01); H01L 27/1104 (2013.01); H01L 27/1116 (2013.01); H01L 27/1211 (2013.01); H01L 29/785 (2013.01); H01L 2924/0002 (2013.01);
Abstract

Monolithic 3D ICs employing one or more local inter-level interconnect integrated intimately with at least one structure of at least one transistor on at least one transistor level within the 3D IC. In certain embodiments the local inter-level interconnect intersects a gate electrode or a source/drain region of at least one transistor and extends through at least one inter-level dielectric layer disposed between a first and second transistor level in the 3D IC. Local inter-level interconnects may advantageously make a direct vertical connection between transistors in different levels of the 3D IC without being routed laterally around the footprint (i.e., lateral, or planar, area) of either the overlying or underlying transistor level that is interconnected.


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