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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9679984 B1

PDFFull Text
Date of Patent:
Jun. 13, 2017

Filed:

Apr. 26, 2013

Metal gate structure with multi-layer composition

Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Hung-Chin Chung, Pingzhen, TW;

Shiang-Rung Tsai, Hsinchu, TW;

Hsien-Ming Lee, Changhua, TW;

Cheng-Lung Hung, Hsinchu, TW;

Hsiao-Kuan Wei, Longtan Township, Taoyuan County, TW;

Assignee:

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsin-Chu, TW;

Attorney:

Haynes and Boone, LLP

Primary Examiner:

Hoang-Quan Ho

Int. Cl.
CPC ...
H01L 29/49 (2006.01); H01L 29/78 (2006.01); H01L 29/51 (2006.01); H01L 21/28 (2006.01); H01L 29/40 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/4966 (2013.01); H01L 21/28079 (2013.01); H01L 21/28088 (2013.01); H01L 29/401 (2013.01); H01L 29/66545 (2013.01); H01L 29/78 (2013.01);
Abstract

The present disclosure provides a semiconductor structure. The semiconductor structure includes a semiconductor substrate and a gate stack disposed on the semiconductor substrate. The gate stack includes a high-k dielectric material layer, a titanium-rich TiN layer over the high-k dielectric layer, and a metal layer disposed over the titanium-rich TiN layer. The metal layer includes aluminum.

Find Patent Forward Citations

Chung, Hung-Chin. (2017). Metal gate structure with multi-layer composition (U.S. Patent No. 9679984). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9679984

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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