The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2017
Filed:
Jul. 14, 2016
Applicant:
Micron Technology, Inc., Boise, ID (US);
Inventors:
Jerome A. Imonigie, Boise, ID (US);
Ian C. Laboriante, Boise, ID (US);
Michael T. Andreas, Boise, ID (US);
Sanjeev Sapra, Boise, ID (US);
Prashant Raghu, Boise, ID (US);
Assignee:
Micron Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); C09D 5/16 (2006.01); C09D 7/12 (2006.01);
U.S. Cl.
CPC ...
H01L 21/306 (2013.01); C09D 5/1625 (2013.01); C09D 7/1233 (2013.01);
Abstract
A surface modification composition comprising a silylation agent comprising a silyl acetamide, a silylation catalyst comprising a perfluoro acid anhydride, an amine-based complexing agent, and an organic solvent. Methods of modifying a silicon-based material and methods of forming high aspect ratio structures on a substrate are also disclosed.