The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2017

Filed:

Oct. 29, 2009
Applicants:

Yu Cao, Cupertino, CA (US);

Jun YE, Palo Alto, CA (US);

James Patrick Koonmen, Santa Clara, CA (US);

Stefan Hunsche, Santa Clara, CA (US);

Inventors:

Yu Cao, Cupertino, CA (US);

Jun Ye, Palo Alto, CA (US);

James Patrick Koonmen, Santa Clara, CA (US);

Stefan Hunsche, Santa Clara, CA (US);

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/32 (2006.01); G03B 27/54 (2006.01); G03B 27/52 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/705 (2013.01); G03F 7/70508 (2013.01); G03F 7/70666 (2013.01);
Abstract

The present invention relates to a method for simulating aspects of a lithographic process. According to certain aspects, the present invention uses transmission cross coefficients to represent the scanner data and models. According to other aspects, the present invention enables sensitive data regarding various scanner subsystems to be hidden from third party view, while providing data and models useful for accurate lithographic simulation.


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