The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2017
Filed:
Dec. 28, 2015
Applicant:
L'air Liquide, Société Anonyme Pour L'etude ET L'exploitation Des Procédés Georges Claude, Paris, FR;
Inventors:
Jean-Marc Girard, Versailles, FR;
Changhee Ko, Tsukuba, JP;
Ivan Oshchepkov, Tsukuba, JP;
Kazutaka Yanagita, Tsukuba, JP;
Shingo Okubo, Tsukuba, JP;
Naoto Noda, Tsukuba, JP;
Julien Gatineau, Seoul, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/455 (2006.01); C23C 16/40 (2006.01); C23C 16/34 (2006.01); C23C 16/24 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0228 (2013.01); C23C 16/24 (2013.01); C23C 16/345 (2013.01); C23C 16/402 (2013.01); C23C 16/45553 (2013.01); H01L 21/0217 (2013.01); H01L 21/0262 (2013.01); H01L 21/02164 (2013.01); H01L 21/02236 (2013.01); H01L 21/02247 (2013.01); H01L 21/02529 (2013.01); H01L 21/02532 (2013.01);
Abstract
Disclosed are methods of depositing silicon-containing films on one or more substrates via vapor deposition processes using penta-substituted disilanes, such as pentahalodisilane or pentakis(dimethylamino)disilane.