The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2017

Filed:

Jun. 19, 2013
Applicants:

Tokyo Electron Limited, Tokyo, JP;

National University Corporation Tokyo University of Agriculture and Technology, Tokyo, JP;

Inventors:

Song yun Kang, Tokyo, JP;

Yoshinao Kumagai, Tokyo, JP;

Akinori Koukitu, Tokyo, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); B05C 19/06 (2006.01); C23C 16/448 (2006.01); H01L 21/02 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
C23C 16/407 (2013.01); B05C 19/06 (2013.01); C23C 16/4488 (2013.01); C23C 16/52 (2013.01); H01L 21/0262 (2013.01); H01L 21/02554 (2013.01);
Abstract

A ZnO film production method includes: disposing a substrate on an installation base; and, while supplying chlorine gas from a chlorine gas supply source to a first raw material storing part Rand supplying oxygen gas from a third gas supply source (oxygen gas supply source) Ginto a reaction container, controlling heating units (heaters H, Hand H) with a control device CONT such that temperature Tof the first raw material storing part R, temperature Tof a second raw material storing part Rand temperature Tof the installation base on which the substrate is disposed satisfy a relationship of T<T<T. Thus, according to the production method of the present disclosure, it is possible to produce a high-quality ZnO film.


Find Patent Forward Citations

Loading…