The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2017
Filed:
Sep. 26, 2014
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Nicolaas Rudolf Kemper, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Marcel Beckers, Eindhoven, NL;
Marco Polizzi, Eindhoven, NL;
Michel Riepen, Veldhoven, NL;
Anthonie Kuijper, Best, NL;
Koen Steffens, Veldhoven, NL;
Adrianes Johannes Baeten, Eindhoven, NL;
Anca Mihaela Antonevici, Veldhoven, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03F 7/20 (2006.01); B01D 19/00 (2006.01);
U.S. Cl.
CPC ...
G03B 27/52 (2013.01); B01D 19/0021 (2013.01); G03F 7/70341 (2013.01);
Abstract
An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.