The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2017
Filed:
Jun. 21, 2012
Sean Kellogg, Portland, OR (US);
Andrew B. Wells, Portland, OR (US);
James B. Mcginn, Portland, OR (US);
N. William Parker, Hillsboro, OR (US);
Mark W. Utlaut, Scappoose, OR (US);
Sean Kellogg, Portland, OR (US);
Andrew B. Wells, Portland, OR (US);
James B. McGinn, Portland, OR (US);
N. William Parker, Hillsboro, OR (US);
Mark W. Utlaut, Scappoose, OR (US);
FEI COMPANY, Hillsboro, OR (US);
Abstract
An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a conductive shield. One or more cooling devices cool the plasma chamber by using evaporative cooling and heat pipes to dissipate the heat from the plasma chamber into a surrounding environment.