The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2017
Filed:
Apr. 01, 2015
Asml Netherlands B.v., Veldhoven, NL;
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Hans Jansen, Eindhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Marco Koert Stavenga, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Martinus Cornelis Maria Verhagen, Valkenswaard, NL;
Lejla Seuntiens-Gruda, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.