The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2017
Filed:
Aug. 02, 2013
Asml Netherlands B.v., Veldhoven, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Ruud Antonius Catharina Maria Beerens, Roggel, NL;
Martinus Agnes Willem Cuijpers, Veldhoven, NL;
Christiaan Alexander Hoogendam, Westerhoven, NL;
Fransiscus Mathijs Jacobs, Asten, NL;
Willem Herman Gertruda Anna Koenen, Roermond, NL;
Erik Roelof Loopstra, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile