The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2017
Filed:
Jun. 18, 2014
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Ming-Feng Wu, San Jose, CA (US);
Leonid Dorf, San Jose, CA (US);
Shahid Rauf, Pleasanton, CA (US);
Ying Zhang, Sunnyvale, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Hamid Tavassoli, Cupertino, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Steven Lane, Porterville, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32669 (2013.01); H01J 37/3233 (2013.01); H01J 37/3244 (2013.01); H01J 37/32082 (2013.01); H01J 37/32422 (2013.01); H01J 37/32458 (2013.01);
Abstract
In a plasma reactor for processing a workpiece, an electron beam is employed as the plasma source, and a remote radical source is incorporated with the process chamber.