The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2017

Filed:

Aug. 13, 2014
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

David W. Shortt, Los Gatos, CA (US);

Steven R. Lange, Alamo, CA (US);

Matthew Derstine, Los Gatos, CA (US);

Kenneth P. Gross, San Carlos, CA (US);

Wei Zhao, Sunnyvale, CA (US);

Ilya Bezel, Sunnyvale, CA (US);

Anatoly Shchemelinin, Pleasanton, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/00 (2006.01); H05H 1/46 (2006.01);
U.S. Cl.
CPC ...
G21K 5/00 (2013.01);
Abstract

The inspection of a sample with VUV light from a laser sustained plasma includes generating pumping illumination including a first selected wavelength, or range of wavelength, containing a volume of gas suitable for plasma generation, generating broadband radiation including a second selected wavelength, or range of wavelengths, by forming a plasma within the volume of gas by focusing the pumping illumination into the volume of gas, illuminating a surface of a sample with the broadband radiation emitted from the plasma via an illumination pathway, collecting illumination from a surface of the sample, focusing the collected illumination onto a detector via a collection pathway to form an image of at least a portion of the surface of the sample and purging the illumination pathway and/or the collection pathway with a selected purge gas.


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