The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Nov. 10, 2011
Hsien-cheng Wang, Hsinchu, TW;
Ming-chang Wen, Kaohsiung, TW;
Chun-kuang Chen, Hsinchu, TW;
Yao-ching Ku, Hsinchu, TW;
Hsien-Cheng Wang, Hsinchu, TW;
Ming-Chang Wen, Kaohsiung, TW;
Chun-Kuang Chen, Hsinchu, TW;
Yao-Ching Ku, Hsinchu, TW;
Abstract
The overlay mark and method for making the same are described. In one embodiment, a semiconductor overlay structure includes gate stack structures formed on the semiconductor substrate and configured as an overlay mark, and a doped semiconductor substrate disposed on both sides of the gate stack structure that includes at least as much dopant as the semiconductor substrate adjacent to the gate stack structure in a device region. The doped semiconductor substrate is formed by at least three ion implantation steps.