The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2017
Filed:
Oct. 24, 2014
International Business Machines Corporation, Armonk, NY (US);
Zeon Corporation, Tokyo, JP;
Robert L. Bruce, White Plains, NY (US);
Sebastian U. Engelmann, New York, NY (US);
Eric A. Joseph, White Plains, NY (US);
Mahmoud Khojasteh, Poughkeepsie, NY (US);
Masahiro Nakamura, Eastchester, NY (US);
Satyavolu S. Papa Rao, Poughkeepsie, NY (US);
Bang N. To, Yorktown Heights, NY (US);
George G. Totir, Newtown, CT (US);
Yu Zhu, West Harrison, NY (US);
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
ZEON CORPORATION, Tokyo, JP;
Abstract
A method for cleaning etch residues that may include treating an etched surface with an aqueous lanthanoid solution, wherein the aqueous lanthanoid solution removes an etch residue that includes a majority of hydrocarbons and at least one element selected from the group consisting of carbon, oxygen, fluorine, nitrogen and silicon. In one example, the aqueous solution may be cerium ammonium nitrate (Ce(NH)(NO)),(CAN).