The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2017
Filed:
May. 22, 2014
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Sascha Bleidistel, Aalen, DE;
Yim-Bun Patrick Kwan, Aalen, DE;
Florian Bach, Oberkochen, DE;
Daniel Benz, Winnenden, DE;
Severin Waldis, Bern, CH;
Armin Werber, Gottenheim, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.