The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9525061 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 20, 2016

Filed:

Jul. 09, 2015
Applicant:

Globalfoundries Singapore Pte. Ltd., Singapore, SG;

Inventors:

Jeoung Mo Koo, Singapore, SG;

Purakh Raj Verma, Singapore, SG;

Guowei Zhang, Singapore, SG;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/06 (2006.01); H01L 29/10 (2006.01); H01L 21/265 (2006.01); H01L 21/762 (2006.01); H01L 21/8238 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7816 (2013.01); H01L 21/26513 (2013.01); H01L 21/76224 (2013.01); H01L 29/0653 (2013.01); H01L 29/10 (2013.01); H01L 29/1079 (2013.01); H01L 29/1083 (2013.01); H01L 29/1095 (2013.01); H01L 29/7835 (2013.01); H01L 21/823892 (2013.01); H01L 29/1087 (2013.01);
Abstract

A device comprising a p-type base region, and a p-type region formed over the p-type base region and in contact with the p-type base region is disclosed. The device also includes an n-well region surrounded by the p-type region, wherein the n-well is formed from an n-type epitaxial layer and the p-type region is formed by counter-doping the same n-type epitaxial layer.


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