The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2016
Filed:
Nov. 03, 2015
Kla-tencor Corporation, Milpitas, CA (US);
Hong Chen, San Ramon, CA (US);
Kenong Wu, Davis, CA (US);
Martin Plihal, Pleasanton, CA (US);
Vidur Pandita, UttarPradesh, IN;
Ravikumar Sanapala, San Jose, CA (US);
Vivek Bhagat, Fremont, CA (US);
Rahul Lakhawat, Chennai, IN;
Oksen Baris, San Francisco, CA (US);
Rajesh Ramachandran, Fremont, CA (US);
Naoshin Haque, San Jose, CA (US);
KLA-Tencor Corp., Milpitas, CA (US);
Abstract
Systems and methods for discovering defects on a wafer are provided. One method includes detecting defects on a wafer by applying a threshold to output generated by a detector in a first scan of the wafer and determining values for features of the detected defects. The method also includes automatically ranking the features, identifying feature cut-lines to group the defect into bins, and, for each of the bins, determining one or more parameters that if applied to the values for the features of the defects in each of the bins will result in a predetermined number of the defects in each of the bins. The method also includes applying the one or more determined parameters to the output generated by the detector in a second scan of the wafer to generate a defect population that has a predetermined defect count and is diversified in the values for the features.