The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 2016

Filed:

Mar. 12, 2015
Applicant:

Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);

Inventors:

Tristan Y. Ma, Lexington, MA (US);

Maureen K. Petterson, Salem, MA (US);

John Hautala, Beverly, MA (US);

Ludovic Godet, Sunnyvale, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/48 (2006.01); H01L 21/027 (2006.01); H01L 21/3105 (2006.01); G03F 7/36 (2006.01); C23C 14/04 (2006.01);
U.S. Cl.
CPC ...
C23C 14/48 (2013.01); C23C 14/042 (2013.01); G03F 7/36 (2013.01); H01L 21/0276 (2013.01); H01L 21/0277 (2013.01); H01L 21/0279 (2013.01); H01L 21/31058 (2013.01);
Abstract

A method for processing a substrate may include providing a patterning feature on the substrate, the patterning feature having a sidewall. The method may further include implanting a first ion species into the patterning feature during a first exposure, the first ion species having a first implantation depth; and implanting a second ion species into the patterning feature during a second exposure, the second ion species having a second implantation depth less than the first implantation depth.


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