The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2016

Filed:

Aug. 20, 2014
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Shruti Vivek Thombare, Sunnyvale, CA (US);

Ishtak Karim, San Jose, CA (US);

Sanjay Gopinath, Fremont, CA (US);

Reza Arghavani, Scotts Valley, CA (US);

Michal Danek, Cupertino, CA (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); H01L 21/02 (2006.01); H01L 21/324 (2006.01); H01J 37/32 (2006.01); C23C 16/06 (2006.01); C23C 16/455 (2006.01); C23C 16/56 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02186 (2013.01); C23C 16/06 (2013.01); C23C 16/405 (2013.01); C23C 16/45529 (2013.01); C23C 16/56 (2013.01); H01J 37/32082 (2013.01); H01J 37/32449 (2013.01); H01J 37/32724 (2013.01); H01L 21/02238 (2013.01); H01L 21/02274 (2013.01); H01L 21/02301 (2013.01); H01L 21/324 (2013.01);
Abstract

Methods of depositing and tuning deposition of sub-stoichiometric titanium oxide are provided. Methods involve depositing highly pure and conformal titanium on a substrate in a chamber by (i) exposing the substrate to titanium tetraiodide, (ii) purging the chamber, (iii) exposing the substrate to a plasma, (iv) purging the chamber, (v) repeating (i) through (iv), and treating the deposited titanium on the substrate to form sub-stoichiometric titanium oxide. Titanium oxide may also be deposited prior to depositing titanium on the substrate. Treatments include substrate exposure to an oxygen source and/or annealing the substrate.


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