The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 2016

Filed:

Mar. 14, 2016
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Abdul Aziz Khaja, San Jose, CA (US);

Mohamad A. Ayoub, Los Gatos, CA (US);

Ramesh Bokka, Milpitas, CA (US);

Jay D. Pinson, II, San Jose, CA (US);

Juan Carlos Rocha-Alvarez, San Carlos, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32458 (2013.01); H01J 37/3211 (2013.01);
Abstract

A plasma source is provided including a core element extending from a first end to a second end along a first axis. The plasma source further includes one or more coils disposed around respective one or more first portions of the core element. The plasma source further includes a plasma block having one or more interior walls at least partially enclosing an annular plasma-generating volume that is disposed around a second portion of the core element. The annular plasma-generating volume includes a first region that is symmetrical about a plurality of perpendicular axes that are perpendicular to a first point positioned on the first axis, the first region having a width in a direction parallel to the first axis and a depth in a direction perpendicular from the first axis. The first region has a width that is at least three times greater than the depth of the first region.


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