The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2016
Filed:
May. 06, 2014
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Andrew Nguyen, San Jose, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Jason A. Kenney, Sunnyvale, CA (US);
Shahid Rauf, Pleasanton, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Yang Yang, Sunnyvale, CA (US);
Steven Lane, Porterville, CA (US);
Yogananda Sarode Vishwanath, Karnataka, IN;
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 7/24 (2006.01); H01J 37/32 (2006.01); C23C 16/455 (2006.01); C23C 16/509 (2006.01); H05H 1/46 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3211 (2013.01); C23C 16/45563 (2013.01); C23C 16/509 (2013.01); H01J 37/32174 (2013.01); H05H 1/46 (2013.01); H05H 2001/4667 (2013.01);
Abstract
A plasma reactor has an overhead multiple coil antennas including a parallel spiral coil antenna and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.