The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2016
Filed:
Jun. 05, 2013
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Udo Dinger, Oberkochen, DE;
Lars Wischmeier, Aalen, DE;
Markus Hauf, Ulm, DE;
Stephan Kellner, Westhausen, DE;
Igor Gurevich, Saarbruecken, DE;
Markus Deguenther, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An EUV lithography systemcomprises an EUV beam path and a monitor beam path The EUV beam path comprises a mirror system, which has a base and a multiplicity of mirror elementshaving concave mirror surfaces, the orientation of which relative to the base is respectively adjustable. The monitor beam pathcomprises at least one monitor radiation source, a screen, the mirror system, which is arranged in the monitor beam pathbetween the monitor radiation sourceand the screen, and a spatially resolving detector In this case, each of a plurality of the mirror elements generates an image of the monitor radiation source in an image plane assigned to the respective mirror elements, distances B between the image planes assigned to the mirror elements and the screen have a maximum distance, distances A between each of the plurality of mirror elements and the image plane assigned to it have a minimum distance, and the maximum distance B is less than half of the minimum distance A.