The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2016
Filed:
Oct. 03, 2013
Asml Netherlands B.v., Veldhoven, NL;
Ramin Badie, Eindhoven, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Johan Frederik Dijksman, Weert, NL;
Antonius Theodorus Wilhelmus Kempen, Den Bosch, NL;
Andrei Mikhailovich Yakunin, Mierlo, NL;
Hendrikus Robertus Marie Van Greevenbroek, Eindhoven, NL;
Koen Gerhardus Winkels, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A radiation source (e.g., LPP—laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.