The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2016
Filed:
Mar. 20, 2015
Asml Netherlands B.v., Veldhoven, NL;
Marcel Beckers, Eindhoven, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Ferdy Migchelbrink, Amersfoort, NL;
Elmar Evers, Almelo, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic apparatus, including a movable table, a projection system configured to project a patterned radiation beam onto a substrate, and a liquid supply system configured to provide liquid to a space between a final element of the projection system and the table, the liquid supply system including an inlet configured to provide liquid to the space, the inlet including an array of inlet orifices located below a bottom surface of the final element and configured to provide an essentially horizontal flow of liquid therefrom, the array of inlet orifices extending along a side of an exposure field of the patterned radiation beam, and an extractor configured to remove liquid from the space, the extractor including a two dimensional array of outlet orifices, extending at least partly in a horizontal direction, through which the liquid can be extracted from the space.