logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9412843 B1

PDFFull Text
Expired
Date of Patent:
Aug. 09, 2016

Filed:

May. 23, 2014

Method for embedded diamond-shaped stress element

Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Eric C. Harley, Lagrangeville, NY (US);

Judson R. Holt, Wappingers Falls, NY (US);

Jin Z. Wallner, Albany, NY (US);

Thomas A. Wallner, Albany, NY (US);

Assignee:

International Business Machines Corporation, Armonk, NY (US);

Attorneys:

Erik K. Johnson

Steven Meyers

Primary Examiner:

Sheng Zhu

Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 21/336 (2006.01); H01L 29/66 (2006.01); H01L 21/308 (2006.01); H01L 29/08 (2006.01); H01L 29/165 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66636 (2013.01); H01L 21/308 (2013.01); H01L 21/3086 (2013.01); H01L 29/0847 (2013.01); H01L 29/6656 (2013.01); H01L 29/7848 (2013.01); H01L 29/165 (2013.01); H01L 29/66545 (2013.01);
Abstract

A method of manufacturing a semiconductor device with an embedded layer, by anisotropically etching a substrate adjacent to an already formed gate structure. A dummy layer is deposited in the previously etched region, and a second spacer is formed next to the first spacer. The dummy layer is removed, and a second anisotropic etch is performed. A semiconductor substrate is then epitaxially grown in the etched out region to form the embedded layer.

Find Patent Forward Citations

Quick Actions:

Harley, Eric. (2016). Method for embedded diamond-shaped stress element (U.S. Patent No. 9412843). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9412843

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…