The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 02, 2016

Filed:

Nov. 19, 2012
Applicants:

Universitat DE Barcelona, Barcelona, ES;

Nanomegas Sprl, Molenbeek-Saint-Jean, BE;

Appfive Llc, Tempe, AZ (US);

Inventors:

Sonia Estrade Albiol, Barcelona, ES;

Joaquin Portillo Serra, Barcelona, ES;

Francisca Peiró Martinez, Barcelona, ES;

José Manuel Rebled Corsellas, Tarragona, ES;

Lluís Yedra Cardona, Barcelona, ES;

Stavros Nicolopoulos, Valencia, ES;

Steven Kim, Phoenix, AZ (US);

Jon Karl Weiss, Tempe, AZ (US);

Assignees:

UNIVERSITAT DE BARCELONA, Barcelona, ES;

NANOMEGAS SPRL, Molenbeek-Saint-Jean, ES;

APPFIVE LLC, Tempe, AZ (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/225 (2006.01); H01J 49/44 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 49/44 (2013.01); G01N 23/2251 (2013.01); G01N 2223/051 (2013.01); G01N 2223/402 (2013.01); H01J 37/28 (2013.01); H01J 2237/1505 (2013.01); H01J 2237/1506 (2013.01); H01J 2237/1507 (2013.01); H01J 2237/2808 (2013.01);
Abstract

A method and system are disclosed for improving characteristic peak signals in electron energy loss spectroscopy (EELS) and energy dispersive x-ray spectroscopy (EDS) measurements of crystalline materials. A beam scanning protocol is applied which varies the inclination, azimuthal angle, or a combination thereof of the incident beam while spectroscopic data is acquired. The method and system may be applied to compositional mapping.


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