The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2016
Filed:
Jan. 18, 2012
Andrei Mikhailovich Yakunin, Mierlo, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Olav Waldemar Vladimir Frijns, Rosmalen, NL;
Andrei Mikhailovich Yakunin, Mierlo, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Olav Waldemar Vladimir Frijns, Rosmalen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A grazing incidence reflector () for EUV radiation includes a first mirror layer () and a multilayer mirror structure () beneath the first mirror layer. The first mirror layer reflects at least partially EUV radiation incident on the reflector with grazing incidence angles in a first range, and the first mirror layer transmits EUV radiation in a second range of incidence angles, which overlaps and extends beyond the first range of incidence angles. The multilayer mirror structure reflects EUV radiation that is incident on the reflector with grazing incidence angles in a second range that penetrates through the first mirror layer. A grazing incidence reflector can be used in a lithographic apparatus and in manufacturing a device by a lithographic process.