The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2016
Filed:
Jul. 08, 2013
Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;
Yusuke Ominami, Tokyo, JP;
Shinsuke Kawanishi, Tokyo, JP;
Hiroyuki Suzuki, Tokyo, JP;
Kohtaro Hosoya, Tokyo, JP;
Masanari Furiki, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
There is provided a charged particle beam apparatus having the function of permitting observation of a sample in a gas atmosphere or in a liquid state, the apparatus being intended to let a dry sample be observed as it is getting saturated with an introduced liquid and to prevent a charged particle beam from getting scattered by an unwanted liquid introduced between a diaphragm and the sample. This invention provides a structure including an inlet-outlet part () that brings in and out a desired liquid or gas in the direction of the underside or the side of the sample (), the structure being arranged so that the sample () is irradiated with a primary charged particle beam while the sample () and the diaphragm () are kept out of contact with each other.