The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2016

Filed:

Aug. 19, 2014
Applicant:

Semiconductor Manufacturing International (Beijing) Corporation, Beijing, CN;

Inventors:

Min-Hwa Chi, Shanghai, CN;

Lihying Ching, Shanghai, CN;

Deyuan Xiao, Shanghai, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/8228 (2006.01); H01L 29/739 (2006.01); G05F 3/30 (2006.01); H01L 21/84 (2006.01); H01L 27/082 (2006.01); H01L 27/12 (2006.01); H01L 29/66 (2006.01); H01L 29/73 (2006.01); H01L 21/265 (2006.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01); H03K 17/60 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7393 (2013.01); G05F 3/30 (2013.01); H01L 21/26586 (2013.01); H01L 21/8228 (2013.01); H01L 21/84 (2013.01); H01L 27/082 (2013.01); H01L 27/1203 (2013.01); H01L 29/0808 (2013.01); H01L 29/0821 (2013.01); H01L 29/1008 (2013.01); H01L 29/66265 (2013.01); H01L 29/66325 (2013.01); H01L 29/7317 (2013.01); H03K 17/60 (2013.01);
Abstract

The present invention provides a bipolar transistor, a method for forming the bipolar transistor, a method for turning on the bipolar transistor, and a band-gap reference circuit, virtual ground reference circuit and double band-gap reference circuit with the bipolar transistor. The bipolar transistor includes: a Silicon-On-Insulator wafer; a base area, an emitter area and a collector area; a base area gate dielectric layer on a top silicon layer and atop the base area; a base area control-gate on the base area gate dielectric layer; an emitter electrode connected to the emitter area via a first contact; a collector electrode connected to the collector area via a second contact; and a base area control-gate electrode connected to the base area control-gate via a third contact. Processes of forming the bipolar transistor are fully compatible with traditional standard CMOS processes; and the base current to turn on the bipolar transistor is based on the GIDL current and formed by applying a voltage to the base area control-gate electrode without any need of contact to the base.


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