The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2016

Filed:

Nov. 05, 2013
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Inventors:

Yu-Ting Yen, Kaohsiung, TW;

Kao-Feng Liao, Hsinchu, TW;

Ying-Ho Chen, Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/00 (2006.01); B08B 3/04 (2006.01); B08B 5/02 (2006.01); B08B 7/04 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01); H01L 21/68 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67057 (2013.01); B08B 3/04 (2013.01); H01L 21/67028 (2013.01); H01L 21/67034 (2013.01); H01L 21/67751 (2013.01); H01L 21/681 (2013.01);
Abstract

The present disclosure relates to a wafer cleaning module for post CMP processes that reduces defects (e.g., watermarks, deposited particles) on a substrate, and an associated method. In some embodiments, the wafer cleaning module has a cleaning tank that may receive a semiconductor substrate within a cleaning medium. A pusher is may vertically move the semiconductor substrate from a starting position within the cleaning tank to an ending position. A position sensor may determine a position of the semiconductor substrate relative to a meniscus of the cleaning medium. Based upon the determined position, a control unit is may adjust a location of the starting position to a predetermined distance below the meniscus.


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