The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2016
Filed:
Apr. 06, 2011
Vadim Iourievich Timoshkov, Veldhoven, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Antonius Theodorus Wilhelmus Kempen, 's-Hertogenbosch, NL;
Andrei Mikhailovich Yakunin, Eindhoven, NL;
Edgar Alberto Osorio Oliveros, Eindhoven, NL;
Vadim Iourievich Timoshkov, Veldhoven, NL;
Jan Bernard Plechelmus van Schoot, Eindhoven, NL;
Antonius Theodorus Wilhelmus Kempen, 's-Hertogenbosch, NL;
Andrei Mikhailovich Yakunin, Eindhoven, NL;
Edgar Alberto Osorio Oliveros, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
There is provided a multilayer mirror () comprising a layer of a first material () and a layer of silicon (). The layer of the first material and the layer of silicon form a stack of layers. An exposed region of the layer of silicon comprises a modification that is arranged to improve the robustness of the exposed region of silicon.