The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2016

Filed:

Dec. 18, 2014
Applicant:

Kabushiki Kaisha Toshiba, Minato-ku, JP;

Inventors:

Chika Tanaka, Yokohama, JP;

Masumi Saitoh, Yokkaichi, JP;

Kensuke Ota, Kawasaki, JP;

Kiwamu Sakuma, Yokkaichi, JP;

Daisuke Matsushita, Fujisawa, JP;

Assignee:

KABUSHIKI KAISHA TOSHIBA, Minato-ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 47/00 (2006.01); H01L 27/24 (2006.01); H01L 45/00 (2006.01);
U.S. Cl.
CPC ...
H01L 27/2436 (2013.01); H01L 27/2463 (2013.01); H01L 27/2481 (2013.01); H01L 45/085 (2013.01); H01L 45/1233 (2013.01); H01L 45/1266 (2013.01); H01L 45/145 (2013.01); H01L 45/146 (2013.01);
Abstract

A semiconductor memory device comprises: a memory cell array comprising first wiring lines, second wiring lines extending crossing the first wiring lines, and memory cells at intersections of the first and second wiring lines, the memory cells being stacked perpendicularly to a substrate, each memory cell comprising a variable resistance element; a first select transistor layer comprising a first select transistor operative to select one of the first wiring lines; a second select transistor layer comprising a second select transistor operative to select one of the second wiring lines; and a peripheral circuit layer on the substrate, the peripheral circuit layer comprising a peripheral circuit that controls a voltage applied to one of the memory cells. The first select transistor layer is provided below the memory cell array perpendicularly to the substrate. The second select transistor layer is provided above the memory cell array perpendicularly to the substrate.


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